Australian and New Zealand agents for Evactron® Plasma cleaners from XEI Scientific

Evactron® Plasma Cleaners can make significant improvements to image quality and image resolution an Electron microscope.

The Evactron® plasma cleaners work by generating a plasma at a Plasma Radical source (PRS) allowing Oxygen radicals to flow through a chamber and removing any unwanted hydrocarbon contamination. The radicals chemically react with the hydrocarbons C02 and H20 which are then pumped out of the system.

Evactron® plasma cleaners are available for mounting directly on the electron microscope column or as a standalone desktop system.

For more information on Evactron® plasma cleaners, or to request a quote, please Contact Us.

Product information: Applications of Plasma Techology in Microscopy

SEM AND FIB VACUUM CHAMBER CLEANING SYSTEM

The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.

The compact design of the Evactron E-Series Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E-Series Plasma Cleaners offer fast, effective, and gentle cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.

Specifications: Evactron E50 and E-TC product sheet

• Designed for SEM/FIB systems
• Fast and efficient hydrocarbon removal
• No damage to samples or sensitive components
• Operates at roughing and turbomolecular pressures
• Remote computer interface

• Designed for SEM/FIB systems
• Fast and efficient hydrocarbon removal
• No damage to samples or sensitive components
• Operates at roughing and turbomolecular pressures
• Remote computer interface

• Cleans SEM/TEM samples
• Cleans TEM grids/sample rods
• Inert sample storage

• Cleans JEOL TEM/STEM columns and Hitachi in-lens SEM chambers
• Fully adjustable ignition and operating pressures
• Dual action cleaning with plasma and UV afterglow