//Evactron Plasma Cleaners
Evactron Plasma Cleaners2021-03-26T09:30:34+00:00

Australian and New Zealand agents for Evactron® Plasma cleaners from XEI Scientific

Evactron® Plasma Cleaners can make significant improvements to image quality and image resolution an Electron microscope.

The Evactron® plasma cleaners work by generating a plasma at a Plasma Radical source (PRS) allowing Oxygen radicals to flow through a chamber and removing any unwanted hydrocarbon contamination. The radicals chemically react with the hydrocarbons C02 and H20 which are then pumped out of the system.

Evactron® plasma cleaners are available for mounting directly on the electron microscope column or as a standalone desktop system.

For more information on Evactron® plasma cleaners, or to request a quote, please Contact Us.

Product information: Applications of Plasma Techology in Microscopy

SEM AND FIB VACUUM CHAMBER CLEANING SYSTEM

The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.

The compact design of the Evactron E-Series Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E-Series Plasma Cleaners offer fast, effective, and gentle cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.

Specifications: Evactron E50 and E-TC product sheet

EVACTRON E50

  • RF Power: 75W peak, 50W continuous
  • Dual action cleaning using plasma and UV afterglow
  • Energy efficient radio frequency hollow cathode plasma (RFHC)
  • “Pop” ignition at high vacuum
  • Android tablet/Bluetooth communication package

EVACTRON E50 E-TC

  • RF Power: 75W peak, 50W continuous
  • Dual action cleaning using plasma and UV afterglow
  • Energy efficient radio frequency hollow cathode plasma (RFHC)
  • “POP” ignition at high vacuum
  • Tethered touchpad communication package

  • Designed for SEM/FIB systems
  • Fast and efficient hydrocarbon removal
  • No damage to samples or sensitive components
  • Operates at roughing and turbomolecular pressures
  • Remote computer interface

EVACTRON ZEPHYR™ MODEL 25 PLASMA CLEANER

  • Desktop controller
  • SEM/FIB chambers or load locks
  • 2 operating regimes
    • classic mode (roughing pressures)
    • T-pump mode (turbomolecular pressures)

EVACTRON ZEPHYR™ MODEL 40 PLASMA CLEANER

  • Designed for OEM integration
  • SEM chambers or load locks
  • Rack mounted controller

EVACTRON ZEPHYR™ MODEL 45 PLASMA CLEANER

  • Designed for OEM integration
  • Capability to change conditions from the controller

  • Designed for SEM/FIB systems
  • Fast and efficient hydrocarbon removal
  • No damage to samples or sensitive components
  • Operates at roughing and turbomolecular pressures
  • Remote computer interface

MODEL 20EP™

  • For cleaning small vacuum chambers
  • Compact desktop controller
  • Sample and chamber cleaning with RF plasma

Specifications: Evactron MODEL 20EP™ product sheet

MODEL ES™

  • Designed for OEM integration
  • Rack mounted controller
  • Horizontal or vertical plasma radical source (PRS)

  • Cleans SEM/TEM samples
  • Cleans TEM grids/sample rods
  • Inert sample storage

SOFTCLEAN EP

  • Android tablet with Bluetooth communication
  • Optional Safar side loaders (US 8,716,676 B2)
  • Accommodates up to three TEM stage rods

  • Cleans JEOL TEM/STEM columns and Hitachi in-lens SEM chambers
  • Fully adjustable ignition and operating pressures
  • Dual action cleaning with plasma and UV afterglow

TEM WAND™ SYSTEM

  • Tabletop controller with one-button operation
  • No damage to sensitive components
  • Gas source is air for ease of use and low cost operation